底水气藏水平井AICD控水完井技术优化

doi:10.7657/XJPG20200409

摘要/Abstract

摘要：

自适应流入控制装置（AICD）控水完井技术目前主要应用于油藏控水,针对气藏的AICD控水完井技术研究尚为空白,为此,开展了适用于气藏控水的新型流道型AICD的控水机理与流动特性分析,建立了塔河油田底水气藏新型流道型AICD控水完井的储集层—井筒耦合动态模型。利用正交试验分析优化了新型流道型AICD的结构参数组合,开展了新型流道型AICD控水完井的控水效果分析。结果表明,与常规射孔完井相比,新型流道型AICD控水完井造成的井底压力损失很小,对凝析油产量影响也很小;新型流道型AICD控水完井可延长底水气藏低产水采气期约365 d,预测20年的累计产水量降低约27%,近井地带含水饱和度普遍降低,具有较好的控水效果。新型流道型AICD控水完井可应用于底水气藏开发,实现控水稳气。

关键词: 底水气藏, 水平井开采, 控水完井技术, 自适应流入控制装置, 数值模拟, 优化

Abstract:

Autonomous Inflow Control Device (AICD) well completion technology has been applied in water control of oil reservoirs. However, the research on the application of AICD well completion technology in gas reservoirs is still lacking. Therefore, the water control mechanism and the flow characteristic of a new channel-type AICD well completion technology suitable for gas reservoirs are analyzed, and a dynamic reservoir-wellbore coupling model for the new channel-type AICD well completion technology is established for the gas reservoirs with bottom water in Tahe oilfield. The structure parameters of the new channel-type AICD well completion technology are optimized by using orthogonal tests and the water control effect of the new technology is analyzed. The results show that compared with the perforation completion, the new channel-type AICD well completion technology causes little bottom hole pressure loss and has little impact on condensate oil production, and the application of the new channel-type AICD well completion technology can prolong the low watercut gas production period by about 365 days. It is predicted that the cumulative water production with the new channel-type AICD well completion technology will decrease by about 27% at the end of the 20th year and the water saturation in the near-wellbore area will decrease, too, indicating a good water control effect. The new channel-type AICD well completion technology can be used for the development of gas reservoirs with bottom water, and water control and steady gas production can be achieved in this kind of reservoirs.

Key words: gas reservoir with bottom water, horizontal well production, water control completion, AICD, numerical simulation, optimization

中图分类号:

TE257

周朝, 赵旭, 姚志良, 党思思, 寇向荣. 底水气藏水平井AICD控水完井技术优化[J]. 新疆石油地质, 2020, 41(4): 444-449.

ZHOU Chao, ZHAO Xu, YAO Zhiliang, DANG Sisi, KOU Xiangrong. Optimization of AICD Well Completion Technology in Horizontal Wells in Gas Reservoirs With Bottom Water[J]. Xinjiang Petroleum Geology, 2020, 41(4): 444-449.

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参数	值	参数	值
气藏中部深度/m	3 950	气藏中部深度处压力/MPa	43.21
露点压力/MPa	43.02	气藏中部深度处温度/℃	94.8
岩石压缩系数/10^-4MPa^-1	0.25	凝析油密度（/ kg·m^-3）	768.2
天然气相对密度	0.77	地层水密度（/ kg·m^-3）	1 153
水平井筒直径/mm	215.9	新型流道型AICD控水完井长度/m	159
新型流道型AICD控水筛管外径/mm	180	新型流道型AICD控水筛管内径/mm	121.4
避水高度/m	6.3	气体偏差系数	1.04

试验编号	低渗段新型流道型 AICD强度系数	流量指数	黏度指数
1	0.000 1	1.0	0.1
2	0.000 1	1.2	0.2
3	0.000 1	1.5	0.5
4	0.000 2	1.0	0.2
5	0.000 2	1.2	0.5
6	0.000 2	1.5	0.1
7	0.000 4	1.0	0.5
8	0.000 4	1.2	0.1
9	0.000 4	1.5	0.2

试验编号	低产水采气期/d	累计产水量变化幅度/%	试验编号	低产水采气期/d	累计产水量变化幅度/%
1	305	-28	6	365	-27
2	245	-24	7	30	82
3			8	25	23
4	0	-4	9	20	121
5	110	2